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Send EmailTetraethyl Orthosilicate, Tetraethoxy Silane, Ethyl Silicate, Silicon Ethoxide, TEOS, 78-10-4
Property | Value |
---|---|
CAS No | 78-10-4 |
Chemical Formula | Si(OC₂H₅)₄ |
Molecular Weight | 208.33 g/mol |
Density | 0.933 g/mL (at 20 °C) |
Boiling Point | 168 °C |
Flash Point | 45 °C |
Hydrolysis | Reacts with water to form SiO₂ and ethanol |
Appearance | Colorless liquid with sharp odor |
Solubility | Soluble in ethanol and isopropanol; reacts with water |
Chemical Synthesis: TEOS is typically produced via alcoholysis of silicon tetrachloride: SiCl₄ + 4 EtOH → Si(OC₂H₅)₄ + 4 HCl
This reaction yields tetraethyl orthosilicate and hydrogen chloride.
Industrial Producers: Global manufacturers include Evonik, Sigma-Aldrich, Wacker, and Momentive, offering both technical and electronic grades.
Available Forms: Liquid form with 98–99% purity, typically packaged in metal-lined IBCs or HDPE drums.
Alternative | Description | Application Area |
---|---|---|
TMOS (Tetramethyl Orthosilicate) | More volatile, faster hydrolysis | Sol-gel processes, thin film coatings |
Sodium Silicate | Aqueous solution, cost-effective | Casting binders, waterproofing |
Ethyl Silicate 40 | Polymerized version of TEOS | Ceramic binders, anti-corrosion coatings |
Silicic Acid Esters | Specialized formulations | Zeolite synthesis, optical glass |
Semiconductor Industry: Used in SiO₂ thin film deposition and insulation layers
Sol-Gel Processes: Precursor for monodisperse silica particles (Stöber method)
Ceramic Mold Binders: Silica-based binders for casting applications
Coating Technologies: Water and oxygen barrier coatings for carpet, glass, metal, and wood
Aerogel Production: Lightweight, porous silica structures via supercritical drying
Zeolite Synthesis: Silica source for catalyst carriers and adsorbents
Passivation Coatings: High-temperature and humidity-resistant metal surface protection
Purpose: Production of SiO₂-based films, coatings, and particles
Method: Controlled hydrolysis and condensation reactions
Use Cases:
Anti-reflective and UV barrier coatings
Hydrophobic and oleophobic surfaces
Monodisperse silica particles (Stöber method)
Purpose: SiO₂ layer formation
Method: CVD or spin-coating followed by thermal curing
Use Cases:
Microchip insulation layers
Dielectric coatings
MEMS device fabrication
Purpose: Strengthening porous stones and waterproofing
Method: TEOS hydrolyzes on stone surfaces, forming SiO₂ to fill microcracks
Use Cases:
Historic building restoration
Marble, travertine, sandstone treatment
Purpose: Silica precursor
Method: Hydrothermal synthesis with aluminum sources
Use Cases:
Petroleum refining catalysts
Adsorbent production
Purpose: Crosslinker and water barrier
Method: Used with organosilicon resins to strengthen polymer networks
Use Cases:
Carpet and textile coatings
Wood and metal surface protectants
Heat-resistant paint systems
Purpose: Ultra-light, porous SiO₂ structures
Method: Sol-gel followed by supercritical drying
Use Cases:
Thermal insulation
Acoustic barriers
Aerospace materials
Name / Alias | Description |
---|---|
Tetraethyl Orthosilicate | Most common and complete chemical name |
Tetraethoxysilane | IUPAC-compliant alternative |
Ethyl Silicate | Frequently used in commercial documents |
Silicon Tetraethoxide | Used in organosilicon classifications |
Si(OC₂H₅)₄ | Molecular formula |
TEOS | Abbreviation – widely used in ERP systems |
Silicic Acid, Tetraethyl Ester | Alternative chemical classification |
Silicon Ethoxide | Found in some supplier catalogs |