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Tetraethyl Orthosilicate, Tetraethoxy Silane, Ethyl Silicate, Silicon Ethoxide, TEOS, 78-10-4

Tetraethyl Orthosilicate, Tetraethoxy Silane, Ethyl Silicate, Silicon Ethoxide, TEOS, 78-10-4

⚙️ Technical Specifications

Property Value
CAS No 78-10-4
Chemical Formula Si(OC₂H₅)₄
Molecular Weight 208.33 g/mol
Density 0.933 g/mL (at 20 °C)
Boiling Point 168 °C
Flash Point 45 °C
Hydrolysis Reacts with water to form SiO₂ and ethanol
Appearance Colorless liquid with sharp odor
Solubility Soluble in ethanol and isopropanol; reacts with water

🏭 Manufacturing

  • Chemical Synthesis: TEOS is typically produced via alcoholysis of silicon tetrachloride: SiCl₄ + 4 EtOH → Si(OC₂H₅)₄ + 4 HCl This reaction yields tetraethyl orthosilicate and hydrogen chloride.

  • Industrial Producers: Global manufacturers include Evonik, Sigma-Aldrich, Wacker, and Momentive, offering both technical and electronic grades.

  • Available Forms: Liquid form with 98–99% purity, typically packaged in metal-lined IBCs or HDPE drums.

🔄 Alternatives

Alternative Description Application Area
TMOS (Tetramethyl Orthosilicate) More volatile, faster hydrolysis Sol-gel processes, thin film coatings
Sodium Silicate Aqueous solution, cost-effective Casting binders, waterproofing
Ethyl Silicate 40 Polymerized version of TEOS Ceramic binders, anti-corrosion coatings
Silicic Acid Esters Specialized formulations Zeolite synthesis, optical glass

🧪 Application Areas

  • Semiconductor Industry: Used in SiO₂ thin film deposition and insulation layers

  • Sol-Gel Processes: Precursor for monodisperse silica particles (Stöber method)

  • Ceramic Mold Binders: Silica-based binders for casting applications

  • Coating Technologies: Water and oxygen barrier coatings for carpet, glass, metal, and wood

  • Aerogel Production: Lightweight, porous silica structures via supercritical drying

  • Zeolite Synthesis: Silica source for catalyst carriers and adsorbents

  • Passivation Coatings: High-temperature and humidity-resistant metal surface protection

🧪 Detailed Usage Breakdown

1. Sol-Gel Applications

  • Purpose: Production of SiO₂-based films, coatings, and particles

  • Method: Controlled hydrolysis and condensation reactions

  • Use Cases:

    • Anti-reflective and UV barrier coatings

    • Hydrophobic and oleophobic surfaces

    • Monodisperse silica particles (Stöber method)

2. Semiconductor Industry

  • Purpose: SiO₂ layer formation

  • Method: CVD or spin-coating followed by thermal curing

  • Use Cases:

    • Microchip insulation layers

    • Dielectric coatings

    • MEMS device fabrication

3. Stone Consolidation & Restoration

  • Purpose: Strengthening porous stones and waterproofing

  • Method: TEOS hydrolyzes on stone surfaces, forming SiO₂ to fill microcracks

  • Use Cases:

    • Historic building restoration

    • Marble, travertine, sandstone treatment

4. Zeolite & Catalyst Synthesis

  • Purpose: Silica precursor

  • Method: Hydrothermal synthesis with aluminum sources

  • Use Cases:

    • Petroleum refining catalysts

    • Adsorbent production

5. Coatings & Resin Systems

  • Purpose: Crosslinker and water barrier

  • Method: Used with organosilicon resins to strengthen polymer networks

  • Use Cases:

    • Carpet and textile coatings

    • Wood and metal surface protectants

    • Heat-resistant paint systems

6. Aerogel Production

  • Purpose: Ultra-light, porous SiO₂ structures

  • Method: Sol-gel followed by supercritical drying

  • Use Cases:

    • Thermal insulation

    • Acoustic barriers

    • Aerospace materials

🧾 Alternate Names

Name / Alias Description
Tetraethyl Orthosilicate Most common and complete chemical name
Tetraethoxysilane IUPAC-compliant alternative
Ethyl Silicate Frequently used in commercial documents
Silicon Tetraethoxide Used in organosilicon classifications
Si(OC₂H₅)₄ Molecular formula
TEOS Abbreviation – widely used in ERP systems
Silicic Acid, Tetraethyl Ester Alternative chemical classification
Silicon Ethoxide Found in some supplier catalogs

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