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Send EmailCopper Anode, Copper Electrode, Cu Anode, Electrolytic Copper Anode, 7440-50-8
Product Name: Copper Anode, Cu Anode (Copper Anode), Electrolytic Copper Anode
Material Type: Pure Copper (Cu) or Copper Alloys
CAS Number: 7440-50-8 (copper)
UN Number: Not classified as hazardous in solid form
EINECS Number: 231-159-6
Chemical Symbol: Cu
| Element | Electrolytic Tough Pitch (Cu-ETP) | Oxygen-Free Copper (Cu-OF) |
|---|---|---|
| Copper (Cu) | ≥99.90 | ≥99.99 |
| Oxygen (O) | 0.02 – 0.05 | ≤0.001 |
| Phosphorus (P) | ≤0.002 | ≤0.0005 |
| Lead (Pb) | ≤0.005 | ≤0.001 |
| Iron (Fe) | ≤0.005 | ≤0.001 |
| Sulfur (S) | ≤0.002 | ≤0.001 |
| Other impurities (total) | ≤0.03 | ≤0.01 |
| Property | Value |
|---|---|
| Color | Reddish-brown (characteristic copper color) |
| Density (20°C) | 8.96 g/cm³ |
| Melting point | 1083°C (1981°F) |
| Boiling point | 2562°C (4644°F) |
| Electrical conductivity (IACS) | 97–101% (depending on temper) |
| Thermal conductivity (20°C) | 385–401 W/(m·K) |
| Specific heat capacity (25°C) | 0.385 J/(g·K) |
| Coefficient of thermal expansion (20–100°C) | 16.5 × 10⁻⁶ /K |
| Hardness (Brinell) | 40–60 HB (annealed), 80–110 HB (hard drawn) |
| Grain size | 20–150 μm (depending on thermomechanical processing) |
| Property | Annealed (Soft) | Hard Drawn |
|---|---|---|
| Tensile strength (MPa) | 220–250 | 300–360 |
| Yield strength (0.2% offset) (MPa) | 60–80 | 250–300 |
| Elongation at break (%) | 45–55 | 5–15 |
| Modulus of elasticity (GPa) | 115–120 | 115–120 |
| Poisson's ratio | 0.34 | 0.34 |
| Shear strength (MPa) | 150–180 | 200–250 |
| Hardness (Vickers, HV) | 40–60 | 90–120 |
| Parameter | Value / Behavior |
|---|---|
| Standard electrode potential (Cu²⁺/Cu) | +0.337 V (vs. SHE) |
| Standard electrode potential (Cu⁺/Cu) | +0.521 V (vs. SHE) |
| Anode polarization behavior | Bath-dependent; less stable than phosphorized copper |
| Anode dissolution efficiency | 95–99% (depending on bath composition) |
| Sludge formation rate (Cu-ETP) | 5–10% (high) |
| Sludge formation rate (Cu-OF) | 2–5% (medium) |
| Operating current density range | 1–6 A/dm² (typical), up to 8 A/dm² (optimized) |
| Current efficiency | 95–100% |
| Corrosion rate (neutral water, 25°C) | ~0.025 mm/year |
| Electrochemical equivalent | 1.185 g/A·h (Cu²⁺ deposition) |
Crystal structure: Face-centered cubic (FCC)
Lattice parameter: a = 0.3615 nm
Atomic radius: 0.128 nm
Role of oxygen (Cu-ETP): Present as Cu₂O at grain boundaries → contributes to anode sludge formation
Oxygen-free copper (Cu-OF): More homogeneous microstructure, lower sludge formation
Recrystallization behavior: Recrystallization temperature ~200–300°C (depending on cold work)
Stacking fault energy: ~78 mJ/m² (high – promotes cross-slip)
Feedstock: Blister copper (~98–99% Cu)
Electrolyte: CuSO₄/H₂SO₄ solution (40–50 g/L Cu²⁺, 150–200 g/L H₂SO₄)
Current density: 200–300 A/m²
Cell voltage: 0.2–0.4 V
Cathode product: Electrolytic copper cathode (≥99.99% Cu)
Temperature: 50–65°C
Process: Electrolytic cathodes → melting (1150–1200°C) → continuous casting → hot rolling → cold drawing/rolling → cutting
Protective atmosphere: Inert gas (Ar or N₂) for oxygen-free copper
Shapes produced: Plate, rod, nugget, ring, custom geometries
Surface finish: Machined or polished to 1.6–3.2 μm Ra
Process: Copper powder → pressing → sintering (800–900°C, H₂ atmosphere)
Application: Porous anodes, high surface area requirements
Primary anodic reaction: Cu → Cu²⁺ + 2e⁻
Side reactions:
Cu₂O (oxide) + 2H⁺ → Cu²⁺ + Cu + H₂O (in acidic baths)
Insoluble Cu₂O particles → sludge formation
Difference from phosphorized copper: No phosphorus in pure copper → no protective phosphide film → higher sludge formation
Sludge composition: Cu₂O, Cu, trace metals (As, Sb, Bi, Se, Te)
Sludge particle size: Typically 1–50 μm
| Parameter | Typical Range |
|---|---|
| Bath composition | CuSO₄·5H₂O: 200–250 g/L, H₂SO₄: 50–70 g/L |
| Chloride (Cl⁻) | 50–100 ppm |
| Temperature | 50–65°C |
| Cathode current density | 2–6 A/dm² |
| Anode:cathode ratio | 1:1 to 2:1 |
| Agitation | Low-pressure air or mechanical |
| Additives (brighteners, levelers, carriers) | As per supplier specifications |
Application: Panel plating, pattern plating, through-hole plating
Current density: 1–3 A/dm²
Requirement: High purity (≥99.9%) and low oxygen content
Why phosphorized copper is preferred: Lower sludge → cleaner bath → fewer defects
Application: Galvanic anode (less common; zinc or aluminum preferred)
Electrolyte: Seawater or soil moisture
Current output: ~25 A·h/kg (low for copper)
Driving voltage (vs. steel): ~0.2 V
Application: Copper electrowinning (lead or stainless steel anodes preferred)
Copper anode use: Used as soluble anode in copper refining
Substrates: Steel, brass, zinc die-cast, aluminum
Typical layer sequence: Copper → nickel → chromium
Anode service life: 6–18 months (continuous operation, bath-dependent)
| Property | Electrolytic Tough Pitch (Cu-ETP) | Oxygen-Free Copper (Cu-OF) | Phosphorized Copper (Cu-P) |
|---|---|---|---|
| P content | <0.002% | <0.0005% | 0.04–0.06% |
| O content | 0.02–0.05% | <0.001% | <0.01% |
| Sludge formation | High (5–10%) | Medium–Low (2–5%) | Very low (≤1%) |
| Anode polarization | Unstable, passivation risk | Near-stable | Very stable |
| Deposit quality | Poor–Medium (can be rough) | Good | Excellent |
| Conductivity (%IACS) | 98–101 | 101+ | 85–95 |
| Cost | Low | High | Medium |
| Typical application | General plating, low quality | Precision electronics | PCB, automotive |
| Shape | Dimension Range | Length | Tolerance |
|---|---|---|---|
| Plate (sheet) | 10–50 mm thickness, 100–500 mm width | 300–1000 mm | ±0.5 mm |
| Round rod | 10–150 mm diameter | 300–2000 mm | ±0.5 mm |
| Hexagonal rod | 10–50 mm across flats | 300–1000 mm | ±0.5 mm |
| Nugget (ball) | 10–50 mm diameter | — | ±5 mm |
| Ring / tube | ID 20–100 mm, OD 50–200 mm | 200–800 mm | ±1.0 mm |
| Custom cast shapes | Upon request | Upon request | As specified |
| Test | Method | Acceptance Criteria |
|---|---|---|
| Chemical composition | ICP-OES, LECO (for O) | Per Section 2 |
| Electrical conductivity | Eddy current (ASTM E1004) | ≥97% IACS |
| Hardness | Brinell (HB 10/500) or Vickers (HV) | Annealed: 40–60 HB |
| Tensile test | ASTM E8/E8M | Per Section 4 |
| Grain size | ASTM E112 (intercept method) | 20–150 μm |
| Surface roughness | Profilometer (Ra) | ≤3.2 μm (machined) |
| Ultrasonic inspection | ASTM E114 | No internal voids or cracks |
| Hydrogen embrittlement test | ASTM B577 | Pass (for oxygen-free copper) |
| Dimensional inspection | Calipers, micrometer | As specified per order |
Pre-cleaning: Alkaline degreaser (60–80°C) → rinse with deionized water
Anode bags: Polypropylene (PP) or polyester (75–150 μm mesh) – prevents sludge accumulation on cathodes
Anode spacing: 50–150 mm from cathode (for uniform current distribution)
Bath agitation: Low-pressure air (CO₂-free) or mechanical stirrer – maintains Cu²⁺ homogeneity
Bath filtration: Continuous filtration (5–10 μm filter paper or cartridge)
Phosphorus addition: Not required for pure copper anodes
Current efficiency correction: Use 95–99% in Faraday's law calculations
Anode replacement frequency: When thickness is reduced by 30–40% (prevents excessive sludge and uneven dissolution)
Bath maintenance: Regular analysis of Cu²⁺, H₂SO₄, Cl⁻, and organic additives
Hazards: No acute toxicity in solid form; fine dust may cause mechanical irritation
Fire risk: Non-flammable in bulk form; fine copper powder (≥40 μm) may be combustible/explosive
Reactivity:
Strong acids (HNO₃) → violent reaction, NOₓ gas evolution
Incompatible with oxidizers (chromates, permanganates)
Ammonia → forms deep blue copper-ammonia complex [Cu(NH₃)₄]²⁺
Acetylene → forms explosive copper acetylide (Cu₂C₂) in presence of moisture
Personal Protective Equipment (PPE):
Gloves (nitrile or neoprene, >0.1 mm thickness, EN 374)
Safety glasses with side shields (EN 166) or chemical goggles
Dust mask (FFP2 or N95) – during cutting/grinding
Steel-toed boots (EN 345) – for heavy handling
Heat-resistant gloves – during thermal processing
First aid:
Inhalation: Remove to fresh air; seek medical attention if respiratory irritation occurs
Skin contact: Wash with soap and water; copper dust may cause mild abrasion
Eye contact: Rinse with water for 15 minutes; seek medical attention
Ingestion: Unlikely for solid form; copper salts are toxic (seek medical attention)
Ecotoxicity: Copper is toxic to aquatic organisms at low concentrations (LC₅₀ 0.1–1 mg/L for algae, crustaceans, and fish)
Persistence in soil: Medium–high; forms complexes with organic matter
Bioaccumulation potential: Low (BCF <100 for most aquatic species)
Recyclability: 100% recyclable; high scrap value
Waste classification (EU): 12 01 09 (non-hazardous metal waste, if clean)
Disposal method: Send to authorized metal recycling facility; do not landfill or incinerate without recovery
Copper-containing wastewater treatment: Ion exchange or precipitation (pH 8–9) → sludge → recycle or disposal
Air emissions control: Baghouse filters or wet scrubbers for grinding/cutting operations
Storage conditions:
Dry, well-ventilated area (relative humidity <60%)
Away from acids, alkalis, ammonia, and oxidizers
Protect from direct sunlight
Wooden pallets or plastic racks (avoid direct metal-to-metal contact – galvanic corrosion)
Store indoors or under cover (prevents excessive tarnishing)
Shelf life: Unlimited (no chemical degradation)
Surface tarnish (patina): Aesthetic only; does not affect electrochemical performance
Tarnish prevention: Store in original packaging or apply thin corrosion-preventive oil film for long-term storage (>12 months)
| Regulation | Classification |
|---|---|
| ADR/RID | Not classified as dangerous goods (solid metal) |
| IMDG | Not regulated |
| IATA | Not regulated |
| Proper shipping name | Copper anodes, solid |
| Packing group | Not applicable |
| Marine pollutant | Yes (for copper salts; not for solid metal) |
| Transport temperature | Ambient |
| Hazard class (for fine powder only) | Class 4.1 (Flammable solid, if particle size <40 μm) |
Copper anode
Cu anode (Copper anode)
Electrolytic copper anode
Copper electrode
Copper plating anode
Anode en cuivre (French)
Kupferanode (German)
Anodo di rame (Italian)
Ánodo de cobre (Spanish)
Медный анод (Russian)
銅陽極 (Japanese)
铜阳极 (Chinese)
| Standard | Compliance / Description |
|---|---|
| ASTM B170 | Electrolytic copper cathodes |
| ASTM B5 | Cu-ETP (Electrolytic Tough Pitch Copper) |
| ASTM F68 | Oxygen-free copper (electronic applications) |
| EN 1976 | Cast copper and copper alloys |
| ISO 9001 | Manufacturing process |
| RoHS (2011/65/EU) | Compliant (no restricted substances – lead content <0.1%) |
| REACH (EC 1907/2006) | Registered (EC 231-159-6) |
| Conflict minerals (Dodd-Frank Section 1502) | Due diligence performed; copper not sourced from DRC conflict zones |
| UL | Recognized for certain forms (e.g., UL 94 for flame retardancy – not applicable) |
High electrical conductivity (97–101% IACS): Maximizes energy efficiency in electroplating and electrolysis
Excellent thermal conductivity (385–401 W/(m·K)): Cooling advantage in high-current applications
High corrosion resistance: Long service life in atmospheric and many aqueous environments
Excellent workability: Soft, easy to shape; custom geometries available
Economical: Lower cost compared to phosphorized or oxygen-free copper
100% recyclable: High scrap value – sustainable and cost-effective over lifecycle
Wide availability: Stocked in all industrial regions
Compatibility with standard bath chemistries: Works in Watts-type, pyrophosphate, cyanide, and fluoroborate baths
Limitation note: For high-quality plating requiring minimal sludge (PCB, semiconductor, automotive decorative), phosphorized copper anodes (Cu-P) are recommended – they offer lower sludge formation (≤1% vs. 5–10%) and more stable polarization behavior.
This TDS is prepared in compliance with ISO 11014-1 format and is intended for electroplating engineers, production managers, quality control laboratories, cathodic protection specialists, and procurement professionals. Certificates of Analysis (CoA), Safety Data Sheets (SDS), mechanical test reports, and sample validation reports are available upon request.