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Copper Anode, Copper Electrode, Cu Anode, Electrolytic Copper Anode, 7440-50-8

Copper Anode, Copper Electrode, Cu Anode, Electrolytic Copper Anode, 7440-50-8

COPPER ANODE (Cu ANODE)

1. Chemical Identity and Material Classification

  • Product Name: Copper Anode, Cu Anode (Copper Anode), Electrolytic Copper Anode

  • Material Type: Pure Copper (Cu) or Copper Alloys

  • CAS Number: 7440-50-8 (copper)

  • UN Number: Not classified as hazardous in solid form

  • EINECS Number: 231-159-6

  • Chemical Symbol: Cu

2. Chemical Composition (Typical, wt%)

Element Electrolytic Tough Pitch (Cu-ETP) Oxygen-Free Copper (Cu-OF)
Copper (Cu) ≥99.90 ≥99.99
Oxygen (O) 0.02 – 0.05 ≤0.001
Phosphorus (P) ≤0.002 ≤0.0005
Lead (Pb) ≤0.005 ≤0.001
Iron (Fe) ≤0.005 ≤0.001
Sulfur (S) ≤0.002 ≤0.001
Other impurities (total) ≤0.03 ≤0.01

3. Physical Properties

Property Value
Color Reddish-brown (characteristic copper color)
Density (20°C) 8.96 g/cm³
Melting point 1083°C (1981°F)
Boiling point 2562°C (4644°F)
Electrical conductivity (IACS) 97–101% (depending on temper)
Thermal conductivity (20°C) 385–401 W/(m·K)
Specific heat capacity (25°C) 0.385 J/(g·K)
Coefficient of thermal expansion (20–100°C) 16.5 × 10⁻⁶ /K
Hardness (Brinell) 40–60 HB (annealed), 80–110 HB (hard drawn)
Grain size 20–150 μm (depending on thermomechanical processing)

4. Mechanical Properties

Property Annealed (Soft) Hard Drawn
Tensile strength (MPa) 220–250 300–360
Yield strength (0.2% offset) (MPa) 60–80 250–300
Elongation at break (%) 45–55 5–15
Modulus of elasticity (GPa) 115–120 115–120
Poisson's ratio 0.34 0.34
Shear strength (MPa) 150–180 200–250
Hardness (Vickers, HV) 40–60 90–120

5. Electrochemical Properties (Critical for Electroplating)

Parameter Value / Behavior
Standard electrode potential (Cu²⁺/Cu) +0.337 V (vs. SHE)
Standard electrode potential (Cu⁺/Cu) +0.521 V (vs. SHE)
Anode polarization behavior Bath-dependent; less stable than phosphorized copper
Anode dissolution efficiency 95–99% (depending on bath composition)
Sludge formation rate (Cu-ETP) 5–10% (high)
Sludge formation rate (Cu-OF) 2–5% (medium)
Operating current density range 1–6 A/dm² (typical), up to 8 A/dm² (optimized)
Current efficiency 95–100%
Corrosion rate (neutral water, 25°C) ~0.025 mm/year
Electrochemical equivalent 1.185 g/A·h (Cu²⁺ deposition)

6. Metallurgical and Microstructural Characteristics

  • Crystal structure: Face-centered cubic (FCC)

  • Lattice parameter: a = 0.3615 nm

  • Atomic radius: 0.128 nm

  • Role of oxygen (Cu-ETP): Present as Cu₂O at grain boundaries → contributes to anode sludge formation

  • Oxygen-free copper (Cu-OF): More homogeneous microstructure, lower sludge formation

  • Recrystallization behavior: Recrystallization temperature ~200–300°C (depending on cold work)

  • Stacking fault energy: ~78 mJ/m² (high – promotes cross-slip)

7. Production Methods

7.1 Electrolytic Refining (Primary Production)

  • Feedstock: Blister copper (~98–99% Cu)

  • Electrolyte: CuSO₄/H₂SO₄ solution (40–50 g/L Cu²⁺, 150–200 g/L H₂SO₄)

  • Current density: 200–300 A/m²

  • Cell voltage: 0.2–0.4 V

  • Cathode product: Electrolytic copper cathode (≥99.99% Cu)

  • Temperature: 50–65°C

7.2 Casting and Thermomechanical Processing (Anode Shaping)

  • Process: Electrolytic cathodes → melting (1150–1200°C) → continuous casting → hot rolling → cold drawing/rolling → cutting

  • Protective atmosphere: Inert gas (Ar or N₂) for oxygen-free copper

  • Shapes produced: Plate, rod, nugget, ring, custom geometries

  • Surface finish: Machined or polished to 1.6–3.2 μm Ra

7.3 Powder Metallurgy (for Special Applications)

  • Process: Copper powder → pressing → sintering (800–900°C, H₂ atmosphere)

  • Application: Porous anodes, high surface area requirements

8. Copper Anode Dissolution Mechanism

  • Primary anodic reaction: Cu → Cu²⁺ + 2e⁻

  • Side reactions:

    • Cu₂O (oxide) + 2H⁺ → Cu²⁺ + Cu + H₂O (in acidic baths)

    • Insoluble Cu₂O particles → sludge formation

  • Difference from phosphorized copper: No phosphorus in pure copper → no protective phosphide film → higher sludge formation

  • Sludge composition: Cu₂O, Cu, trace metals (As, Sb, Bi, Se, Te)

  • Sludge particle size: Typically 1–50 μm

9. Application Areas – Electroplating Industry

9.1 Acid Copper Plating (Watts-type Bath)

Parameter Typical Range
Bath composition CuSO₄·5H₂O: 200–250 g/L, H₂SO₄: 50–70 g/L
Chloride (Cl⁻) 50–100 ppm
Temperature 50–65°C
Cathode current density 2–6 A/dm²
Anode:cathode ratio 1:1 to 2:1
Agitation Low-pressure air or mechanical
Additives (brighteners, levelers, carriers) As per supplier specifications

9.2 PCB (Printed Circuit Board) Manufacturing

  • Application: Panel plating, pattern plating, through-hole plating

  • Current density: 1–3 A/dm²

  • Requirement: High purity (≥99.9%) and low oxygen content

  • Why phosphorized copper is preferred: Lower sludge → cleaner bath → fewer defects

9.3 Cathodic Protection Systems (Ships and Pipelines)

  • Application: Galvanic anode (less common; zinc or aluminum preferred)

  • Electrolyte: Seawater or soil moisture

  • Current output: ~25 A·h/kg (low for copper)

  • Driving voltage (vs. steel): ~0.2 V

9.4 Electrolysis and Electrowinning

  • Application: Copper electrowinning (lead or stainless steel anodes preferred)

  • Copper anode use: Used as soluble anode in copper refining

9.5 Decorative and Industrial Plating

  • Substrates: Steel, brass, zinc die-cast, aluminum

  • Typical layer sequence: Copper → nickel → chromium

  • Anode service life: 6–18 months (continuous operation, bath-dependent)

10. Comparison of Copper Anode Types

Property Electrolytic Tough Pitch (Cu-ETP) Oxygen-Free Copper (Cu-OF) Phosphorized Copper (Cu-P)
P content <0.002% <0.0005% 0.04–0.06%
O content 0.02–0.05% <0.001% <0.01%
Sludge formation High (5–10%) Medium–Low (2–5%) Very low (≤1%)
Anode polarization Unstable, passivation risk Near-stable Very stable
Deposit quality Poor–Medium (can be rough) Good Excellent
Conductivity (%IACS) 98–101 101+ 85–95
Cost Low High Medium
Typical application General plating, low quality Precision electronics PCB, automotive

11. Product Forms and Dimensions (Typical)

Shape Dimension Range Length Tolerance
Plate (sheet) 10–50 mm thickness, 100–500 mm width 300–1000 mm ±0.5 mm
Round rod 10–150 mm diameter 300–2000 mm ±0.5 mm
Hexagonal rod 10–50 mm across flats 300–1000 mm ±0.5 mm
Nugget (ball) 10–50 mm diameter ±5 mm
Ring / tube ID 20–100 mm, OD 50–200 mm 200–800 mm ±1.0 mm
Custom cast shapes Upon request Upon request As specified

12. Quality Control and Testing Methods

Test Method Acceptance Criteria
Chemical composition ICP-OES, LECO (for O) Per Section 2
Electrical conductivity Eddy current (ASTM E1004) ≥97% IACS
Hardness Brinell (HB 10/500) or Vickers (HV) Annealed: 40–60 HB
Tensile test ASTM E8/E8M Per Section 4
Grain size ASTM E112 (intercept method) 20–150 μm
Surface roughness Profilometer (Ra) ≤3.2 μm (machined)
Ultrasonic inspection ASTM E114 No internal voids or cracks
Hydrogen embrittlement test ASTM B577 Pass (for oxygen-free copper)
Dimensional inspection Calipers, micrometer As specified per order

13. Operating Recommendations for Electroplating Baths

  • Pre-cleaning: Alkaline degreaser (60–80°C) → rinse with deionized water

  • Anode bags: Polypropylene (PP) or polyester (75–150 μm mesh) – prevents sludge accumulation on cathodes

  • Anode spacing: 50–150 mm from cathode (for uniform current distribution)

  • Bath agitation: Low-pressure air (CO₂-free) or mechanical stirrer – maintains Cu²⁺ homogeneity

  • Bath filtration: Continuous filtration (5–10 μm filter paper or cartridge)

  • Phosphorus addition: Not required for pure copper anodes

  • Current efficiency correction: Use 95–99% in Faraday's law calculations

  • Anode replacement frequency: When thickness is reduced by 30–40% (prevents excessive sludge and uneven dissolution)

  • Bath maintenance: Regular analysis of Cu²⁺, H₂SO₄, Cl⁻, and organic additives

14. Safety and Handling

  • Hazards: No acute toxicity in solid form; fine dust may cause mechanical irritation

  • Fire risk: Non-flammable in bulk form; fine copper powder (≥40 μm) may be combustible/explosive

  • Reactivity:

    • Strong acids (HNO₃) → violent reaction, NOₓ gas evolution

    • Incompatible with oxidizers (chromates, permanganates)

    • Ammonia → forms deep blue copper-ammonia complex [Cu(NH₃)₄]²⁺

    • Acetylene → forms explosive copper acetylide (Cu₂C₂) in presence of moisture

  • Personal Protective Equipment (PPE):

    • Gloves (nitrile or neoprene, >0.1 mm thickness, EN 374)

    • Safety glasses with side shields (EN 166) or chemical goggles

    • Dust mask (FFP2 or N95) – during cutting/grinding

    • Steel-toed boots (EN 345) – for heavy handling

    • Heat-resistant gloves – during thermal processing

  • First aid:

    • Inhalation: Remove to fresh air; seek medical attention if respiratory irritation occurs

    • Skin contact: Wash with soap and water; copper dust may cause mild abrasion

    • Eye contact: Rinse with water for 15 minutes; seek medical attention

    • Ingestion: Unlikely for solid form; copper salts are toxic (seek medical attention)

15. Environmental and Disposal Information

  • Ecotoxicity: Copper is toxic to aquatic organisms at low concentrations (LC₅₀ 0.1–1 mg/L for algae, crustaceans, and fish)

  • Persistence in soil: Medium–high; forms complexes with organic matter

  • Bioaccumulation potential: Low (BCF <100 for most aquatic species)

  • Recyclability: 100% recyclable; high scrap value

  • Waste classification (EU): 12 01 09 (non-hazardous metal waste, if clean)

  • Disposal method: Send to authorized metal recycling facility; do not landfill or incinerate without recovery

  • Copper-containing wastewater treatment: Ion exchange or precipitation (pH 8–9) → sludge → recycle or disposal

  • Air emissions control: Baghouse filters or wet scrubbers for grinding/cutting operations

16. Storage and Shelf Life

  • Storage conditions:

    • Dry, well-ventilated area (relative humidity <60%)

    • Away from acids, alkalis, ammonia, and oxidizers

    • Protect from direct sunlight

    • Wooden pallets or plastic racks (avoid direct metal-to-metal contact – galvanic corrosion)

    • Store indoors or under cover (prevents excessive tarnishing)

  • Shelf life: Unlimited (no chemical degradation)

  • Surface tarnish (patina): Aesthetic only; does not affect electrochemical performance

  • Tarnish prevention: Store in original packaging or apply thin corrosion-preventive oil film for long-term storage (>12 months)

17. Transport Information

Regulation Classification
ADR/RID Not classified as dangerous goods (solid metal)
IMDG Not regulated
IATA Not regulated
Proper shipping name Copper anodes, solid
Packing group Not applicable
Marine pollutant Yes (for copper salts; not for solid metal)
Transport temperature Ambient
Hazard class (for fine powder only) Class 4.1 (Flammable solid, if particle size <40 μm)

18. Synonyms and Common Names

  • Copper anode

  • Cu anode (Copper anode)

  • Electrolytic copper anode

  • Copper electrode

  • Copper plating anode

  • Anode en cuivre (French)

  • Kupferanode (German)

  • Anodo di rame (Italian)

  • Ánodo de cobre (Spanish)

  • Медный анод (Russian)

  • 銅陽極 (Japanese)

  • 铜阳极 (Chinese)

19. Certifications and Standards Compliance

Standard Compliance / Description
ASTM B170 Electrolytic copper cathodes
ASTM B5 Cu-ETP (Electrolytic Tough Pitch Copper)
ASTM F68 Oxygen-free copper (electronic applications)
EN 1976 Cast copper and copper alloys
ISO 9001 Manufacturing process
RoHS (2011/65/EU) Compliant (no restricted substances – lead content <0.1%)
REACH (EC 1907/2006) Registered (EC 231-159-6)
Conflict minerals (Dodd-Frank Section 1502) Due diligence performed; copper not sourced from DRC conflict zones
UL Recognized for certain forms (e.g., UL 94 for flame retardancy – not applicable)

20. Why Choose Copper Anodes? (Technical Summary)

  • High electrical conductivity (97–101% IACS): Maximizes energy efficiency in electroplating and electrolysis

  • Excellent thermal conductivity (385–401 W/(m·K)): Cooling advantage in high-current applications

  • High corrosion resistance: Long service life in atmospheric and many aqueous environments

  • Excellent workability: Soft, easy to shape; custom geometries available

  • Economical: Lower cost compared to phosphorized or oxygen-free copper

  • 100% recyclable: High scrap value – sustainable and cost-effective over lifecycle

  • Wide availability: Stocked in all industrial regions

  • Compatibility with standard bath chemistries: Works in Watts-type, pyrophosphate, cyanide, and fluoroborate baths

  • Limitation note: For high-quality plating requiring minimal sludge (PCB, semiconductor, automotive decorative), phosphorized copper anodes (Cu-P) are recommended – they offer lower sludge formation (≤1% vs. 5–10%) and more stable polarization behavior.

This TDS is prepared in compliance with ISO 11014-1 format and is intended for electroplating engineers, production managers, quality control laboratories, cathodic protection specialists, and procurement professionals. Certificates of Analysis (CoA), Safety Data Sheets (SDS), mechanical test reports, and sample validation reports are available upon request.

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